Uis2/uis objective lenses, M p l, F l n - 1 0 0 b d – Olympus Microscope User Manual
Page 8: Plan)
7
UIS2/UIS OBJECTIVE LENSES
M P L
(Plan)
F L N - 1 0 0 B D
■
Objective lens series list
■
Meaning of abbreviations shown on objective lens
■
Objective lens notation
■
Features of objective lens series
None: Brightfield
BD:
Brightfield/darkfield
BDP: Brightfield/darkfield/
polarizing
IR:
IR
LCD: LCD
None: UIS
N:
UIS2
Number:
Objective lens
magnification
Series
Magnification
BF
DF
DIC
*1
POL
FL
F.N. (Field Number)
Remarks
UIS2
MPLFLN
1.25/2.5
\
1.25x: 22 / 2.5x: 26.5
Use together with polarizer and analyzer
recommended
5/10/20/50/100
\
\U
\
\
*2
26.5
LMPLFLN
5/10/20/50/100
\
\L
\
\
26.5
MPLN
5/10/20/50/100
\
22
LCPLFLN-LCD
20/50/100
\
\L
26.5
For LCD
UIS
MPlanApo
20/50/100
\
\
*3
U
\
26.5
SLMPlan
20/50
\
26.5
LMPlanIR/MPlanIR
5/10/20/50/100 *
4
\
22
For near-IR observation
UIS2
MPLFLN-BD
5/10/20/50/100/150
\
\
\U
\
\
*2
26.5
MPLFLN-BDP
5/10/20/50/100
\
\
aU
a
\
*2
26.5
LMPLFLN-BD
5/10/20/50/100
\
\
\L
\
\
26.5
MPLN-BD
5/10/20/50/100
\
\
22
UIS
MPlanApo-BD
100
\
\
\U
\
26.5
*
1
DIC prism U-DICR: UM/LM position, U-DICRHC: LM position fixed, U-DICRH: UM position fixed. *
2
5~20x: U excitation also possible
*
3
50x: DIC observation not applicable *
4
MPlanIR: available 100x only \: Responds a: Optimally responds BF: Brightfield DF: Darkfield
DIC: Differential Interference Contrast POL: Polarized light FL: Fluorescence
M:
Metallurgical (no cover)
LM:
Long working distance
metallurgical use
SLM: Super long working
distance metallurgical use
LC:
Observation through
substrate
None: Achromat/
Corrects aberration at 2 wavelengths of
blue and red
FL:
SemiApochromat/
Corrects chromatic aberration in the
visible range (violet~red)
APO:
Apochromat/
Optimally corrects chromatic aberration
in the entire visible band (violet~red)
PL: Plan/
Corrects field
curvature of
the periphery of
the image plane
Magnification
Objective lenses series abbreviation (PL: Plan)
N.A. (Numerical Aperture)
Field Number
For brightfield observation
Infinity-corrected optical system
Cover glass thickness (no cover)
a
MPLFLN series: M Plan SemiApochromat — P 8
Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration.
The lineup consists of 7 objective lenses ranging from 1.25x to 100x, and secures a W.D. of
1mm or longer. Since the exit pupil position of the 5x-100x objective lenses is standardized,
the position of the DIC prism does not have to be switched when changing the magnification.
For ultra low magnifications (1.25x, 2.5x), use together with analyzer and polarizer of the
reflected light illuminator.
a
LMPLFLN series: Long WD M Plan SemiApochromat — P 9
Long working distance Plan SemiApochromat objective lenses, giving high-level correction
for chromatic aberration. Suitable with samples having a height difference and in preventing
collision, as the working distance is long. Also, since the exit pupil position of the 5x-100x
objective lenses is standardized, the position of the DIC prism does not have to be switched
when changing the magnification.
a
MPLN series: M Plan Achromat — P 10
Plan Achromat objective lenses providing excellent image flatness up to F.N. 22.
a
LCPLFLN-LCD series: LCD Long WD M Plan SemiApochromat — P 11
Perfect objective lens series for observation of LCD panels and other samples through a
glass substrate. Aberration correction matched to the glass thickness is accomplished using
a correction ring.
a
MPlanApo series: M Plan Apochromat — P 12
Highest class Plan Apochromat objective lenses that maximize performance in brightfield
observation. All aberrations are corrected at the highest level, while providing high N.A.
a
SLMPlan series: Super Long WD M Plan Achromat — P 12
Plan Achromat objective lenses with high magnification and super long working distance.
Two magnifications, 20x and 50x are available. For 5x or 10x objective lenses, select from
the LMPLFLN Series.
a
LMPlan-IR series: IR Long WD M Plan SemiApochromat — P 13
MPlan-IR: IR M Plan SemiApochromat — P 13
IR objective lenses which compensate for aberrations from visible to near infrared light.
Ideal for the observations of semiconductor interiors and the back surface of a chip package
as well as CSP bump inspection.
a
MPLFLN-BD series: M Plan SemiApochromat BD — P 14
Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration.
The series secures a W.D. of 1mm or longer. Since the exit pupil position of the 5x-150x
objective lenses is standardized, the position of the DIC prism does not have to be switched
when changing the magnification.
a
MPLFLN-BDP series: M Plan SemiApochromat BDP — P 15
Plan SemiApochromat objective lenses, giving high-level correction for chromatic aberration.
The series secures a W.D. of 1mm or longer. Since the exit pupil position of the 5x-100x
objective lenses is standardized, the position of the DIC prism does not have to be switched
when changing the magnification. The BDP series optimizing brightfield/darkfield and
polarized light characteristics is perfect for Nomarski DIC and polarized light observations.
a
LMPLFLN-BD series: Long WD M Plan SemiApochromat BD — P 16
Long working distance Plan SemiApochromat objective lenses, giving high-level correction
for chromatic aberration. Suitable with samples having a height difference and in preventing
collision, as the working distance is long. Also, since the exit pupil position of the 5x-100x
objective lenses is standardized, the position of the DIC prism does not have to be switched
when changing the magnification.
a
MPLN-BD series: M Plan Achromat BD — P 17
Plan Achromat objective lenses providing excellent image flatness up to F.N. 22.
a
MPlanApo BD: Plan Apochromat BD — P 18
Highest class Plan Apochromat objective lens that maximize performance in brightfield and
darkfield observations. All aberrations are corrected at the highest level, while providing
high N.A.