VICI NP2 - Manual (Page 2)

1
Introduction
The Valco Helium Purifier (HP2) and Nitrogen Purifier (NP2) provide “point-
of-use” carrier gas purification to sub-ppm levels of gaseous impurities.
Designed originally for the Valco Trace Gas Analysis system with its Helium
Ionization Detectors, the Helium Purifier provides point-of-use ultrahigh-
purity helium for use in any chromatographic application requiring high-
quality helium or other noble gas (Ar, Ne, Kr, Xe). The Nitrogen Purifier was
developed for use with our Electron Capture Detector.
Specifications
Gases purified
Max. operating pressure
Max. operating temperature
Max. flow rate
Impurities removed
Impurities not removed
He, Ne, Ar, Kr, Xe, Rn
1000 psig
400°C
1 liter/min
Outlet impurities less than 10 ppb
H
2
O, H
2
, O
2
, N
2
, NO, NH
3
, CO, and
CO
2
, based on 10 ppm total inlet
impurities. Other impurities
removed include CF
4
, CCl
4
, SiH
4
,
and hydrocarbons such as CH
4
He, Ne, Ar, Kr, Xe, and Rn
He, Ne, Ar, Kr, Xe, Rn, N
2
1000 psig
400°C
1 liter/min
Outlet impurities less than 10 ppb
H
2
O, H
2
, O
2
, NO, NH
3
, CO, and CO
2
,
based on 10 ppm total inlet impurities.
Other impurities removed include
CF
4
, CCl
4
, SiH
4
, and hydrocarbons
He, Ne, Ar, Kr, Xe, Rn, CH
4
, and N
2
Helium Purifier
(HP2)
Nitrogen Purifier
(NP2)
WARNING!
This product is
not for use with oxygen – either pure
oxygen or gases with a significant proportion of
oxygen. The purifier’s gettering alloy is
pyrophoric
at operating temperature. Use with significant
amounts of oxygen can result in combustion of the
material, potential damage to the surrounding area,
and possible injury.
In no event shall Valco Instruments Co. Inc. be liable
for any direct, indirect, special, incidental, or con-
sequential damage, whether based on contract, tort,
or any other legal theory and whether advised of the
possibility of such damages.