Setting wipe modifiers, Main pattern and sub pattern modifiers – Sony DVS-9000 User Manual

Page 242

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Chapter 5

Wipes

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242

Basic Procedure for Wipe Settings

DVS-9000/9000SF

3-704-674-01 (1)

You can also apply the dust mix function to the pattern generated by a
pattern mix.

Note

When a rotary wipe (pattern numbers 100-107, 150, 151, 156, 158, 160,
162, 516, 518, 604, 606, 624, and 661) or random/diamond dust wipe
(pattern numbers 270-274) is selected, the dust mix function is not
available.

Setting Wipe Modifiers

You can apply various modifiers to the wipe pattern: setting the wipe direction,
pattern position, and so on.

For an overview of the wipe modifiers, see “Wipe Pattern Variation and
Modifiers” (page 49).
Note that the available modifiers may depend on the pattern you are using. For
details, see “Possible combinations of wipe patterns and modifiers” (page
252).

Main pattern and sub pattern modifiers

You can make independent settings of the modifiers for the main pattern and
sub pattern.
• To set the modifiers for the main pattern, in the M/E-1> Wipe menu, select

HF5 ‘Main Modify,’ and make the settings in the Main Modify menu.

• To set the modifiers for the sub pattern, select HF6 ‘Sub Modify,’ and make

the settings in the Sub Modify menu.

Operations in the Main Modify menu and Sub Modify menu are the same.

Independently set modifiers for the main pattern and sub pattern

• Positioner
• Rotation
• Aspect ratio
• Pattern replication (MULTI)
• Pairing
• Modulation
• Spring
• Spiral

3

V Size

Particle height

0.00 to 100.00

4

Flash Rate

Rate of generation of particles

0.00 to 100.00

Knob

Parameter

Adjustment

Setting values

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