VEGA VEGADIF 65 4 … 20 mA User Manual

Page 74

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74

10 Supplement

VEGADIF 65 • 4 … 20 mA

36236-EN-130417

Measuring ranges

1 year

5 years

500 mbar, 3 bar, 16 bar

±0.05 %

±0.125 %

Ambient conditions
Ambient, storage and transport temperature

Ʋ Standard version

-40 … +80 °C (-40 … +176 °F)

Ʋ Version for oxygen applications

17)

-40 … +60 °C (-40 … +140 °F)

Ʋ Versions IP 66/IP 68 (1 bar) connec-

tion cable PE

-20 … +60 °C (-4 … +140 °F)

Ʋ Versions IP 66/IP 68 (1 bar) and IP 68,

connection cable PUR

-20 … +80 °C (-4 … +176 °F)

Process conditions
The pressure and temperature specifications are used as overview. In general, the max. pressure

for the pressure transmitter depends on the weakest (with regard to pressure) link. In detail, the

respective specifications of the type label apply.
Process temperature limits
Specifications apply to the basic version as well as to the minus side with version with single

chemical seal

18)

Ʋ With measuring cells PN 420

Lower temperature limit -10 °C (+14 °F).

Ʋ With effective pressure lines longer

than 100 mm

-40 … +120 °C (-40 … +248 °F)

Ʋ With effective pressure lines longer

than 100 mm, process fitting steel

C22.8

-40 … +120 °C (-40 … +248 °F)

Specifications apply to suitable chemical seals

Ʋ Chemical seal CSS plus side, CSB

both sides

-40 … +400 °C (-40 … +752 °F)

Process temperature limits according to the seal material

Seal material

Temperature limits

FKM

-20 … +85 °C (-4 … +185 °F)

FFKM (Kalrez 6375)

-5 … +85 °C (23 … +185 °F)

EPDM

-40 … +85 °C (-40 … +185 °F)

PTFE

-40 … +85 °C (-40 … +185 °F)

NBR

-20 … +85 °C (-4 … +185 °F)

Copper

-40 … +85 °C (-40 … +185 °F)

Copper, for oxygen application

-20 … +60 °C (-4 … +140 °F)

FKM, cleaned

-10 … +85 °C (+14 … +185 °F)

FKM, for oxygen application

-10 … +60 °C (-4 … +140 °F)

PTFE, for oxygen application

-20 … +60 °C (-4 … +140 °F)

Process pressure limits according to measuring range

17)

Up to 60 °C (140 °F).

18)

For the version for oxygen application, note chapter "Oxygen applications".

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