Labconco CentriVap Refrigerated Centrifugal Concentrators 7310000 Series - Manual (Page 15)

Chapter 3: Getting Started
Product Service 1-800-522-7658 11
Acids Bases Solvents
COMPONENT MATERIAL
Acetic Acid 20% Boric Acid F
or
m
ic Acid
H
ydrobromic Acid 20%
H
ydrochloric Acid 20%
Nitr
ic Acid 20%
Sulfur
ic Acid 10
%
Trifluoroacetic Acid
(TFA
)
Ammonium H
ydr
oxide
Acetone Acetonitrile Chl
oroform
Dimeth
yl F
or
m
amide
Dimeth
yl Sulfoxide
Ethanol Eth
yl Acetate
Hexanes Iso
pro
ponal
Methanol Meth
ylene Chloride
Meth
yl t-
But
yl Ether
Toluene Wate
r
Rotor Hub Acetal C C C D D D C D C
Chamber &
Cold Trap Lid
Acrylic C D C D D D D C D D C D D
Chamber
Epoxy coated
Aluminum
C D C D
Tubing PVC D C D D D D D D C D D D D
Lid Gasket EPDM D D C D
Cold Trap
Gasket
Neoprene D D C D D C D D D D D C D
Rotor
Anodized
Aluminum
D D
Rotor Shaft &
Cold Trap Stainless
Steel
D D D
Bearings
High Carbon
Steel
D D D D D D D D D
C-Moderate Degradation - Questionable use
D-Severe Degradation - Infrequent use recommended - immediate thorough
neutralizing and cleaning is required.
Acid Resistant models have a number of enhancements to minimize chemical
attack on components. The lid is glass, the chamber and rotors are PTFE coated,
the rotor shaft is Hastelloy, bearing are stainless steel and the coupling insert is
polypropylene, and all wetted parts in the vacuum release valve are made from
PTFE. Even though parts in the Acid Resistant models are considerably more
resistant to corrosion, it is very important that the CentriVap is immediately
cleaned and neutralized.
• If a rotary vane vacuum pump is used, frequent oil changes are required.
Most compounds used in the CentriVap will degrade the oil if allowed to
enter to pump.
• Diaphragm vacuum pumps sold by Labconco have wetted parts either made
from PTFE or protected by PTFE coatings and are suitable for nearly all
procedures.
• When using compounds in the CentriVap that are hostile to the materials of
construction, it is imperative that the equipment is appropriately maintained.
After each run, clean up all residues, spills and materials that might have
splashed in the chamber.