INFICON XTC/C Thin Film Deposition Controller - Manual (Page 58)

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XTC/C - XTC/2 Operating Manual
2.7.2 Monitoring - Systems with a Source Shutter
In addition to measuring rate and thickness, these instruments can be used to
terminate the deposition at the proper thickness. Implementation requires that
the deposition system have a source (or substrate) shutter capable of automatic
operation. The source shutter controller must be wired through the SYSTEM I/O
connector on the rear panel of the instrument. The following parameters (in
addition to those required in the section above) must also be programmed.
DEP RATE . . . . . . . . . . . . . . . . . . . Program to 0.1 Å/sec.
NOTE: Programming the DEP RATE to
0.0 Å/sec skips the Deposit state.
FINAL THK . . . . . . . . . . . . . . . . . . Program to the desired film thickness.
In addition set all of the pre and post deposition parameters to zero (see
Chapter 4, Programming System Operation Details ).
The operator manually increases the source power (using the source power
supply’s control) to the nominal operating level. Once the user is satisfied, the
deposition begins when the START switch is pressed. This action zeros the
accumulated thickness display and opens the source shutter. The operator
must then adjust the source power manually to achieve the desired rate. The
shutter will close automatically when the final thickness set point is achieved.