3 rate sampling – INFICON XTC/C Thin Film Deposition Controller User Manual
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XTC/C - XTC/2 Operating Manual
2.7.3 Rate Sampling
It is possible to use these instruments to periodically sample the rate in a
deposition system. A shuttered transducer must be used, see
NOTE: It will be useful to refer to the separate INFICON Crystal Sensor Manual
(see list below) for transducer and actuator control valve installation.
IPN
Type
074-154 . . . . . . Bakeable
074-155 . . . . . . CrystalSix
074-156 . . . . . . Standard, Compact and Dual
074-157 . . . . . . Sputtering
1
Electrically connect the pneumatic shutter actuator control valve (IPN
007-199) to the sensor shutter pins of the SYSTEM I/O connector.
CAUTION
Verify proper electrical connection, do not confuse the
source shutter relay with the sensor shutter relay.
2
Program the DEP RATE parameter to 0.1 Å/sec.
NOTE: Programming the DEP RATE to 0.0 Å/sec skips the Deposit state.
3
Program the FINAL THK parameter to a value which allows approximately
20 seconds of material accumulation onto the sensor head. For example, if
the nominal rate is 20 Å/sec, set the final thickness to 20 sec x 20 Å/sec =
400Å. If the sample time is too short there could be errors induced by
temperature transients across the monitor crystal.
A sample is initiated by pressing START (from the READY mode). This zeros
the displayed thickness and opens the sensor shutter. The operator may view
the deposition rate display (allowing it to stabilize) and then comparing it to the
desired rate. If a time longer than the programmed sample time is required to
adjust the actual deposition rate the operator can press the MPWR key. Once
the adjustments are completed, again pressing the MPWR key closes the
shutter.