EXFO PSO-200 Optical Modulation Analyzer - Manual (Page 76)

Viewing and Analyzing Results
68 PSO-200
Using Pattern Masks
Specific requirements for intensity (and EVM) masks:

You can enter as many coordinates (x,y pairs) as needed to form the
shape of the center mask.
Points must be listed in the order one would use when hand drawing
the polygon, regardless of the starting point and direction.

You can apply margins, as zones for points “possibly” in error.
Measurements falling in this margin are included in the table.
You can enter a global margin that will apply around the entire mask,
or you can define another surrounding custom polygon with a different
shape. If you define both, the latter takes precedence.
Center mask polygon points
Upper (uz) and lower (lz) mask zones
(Y-axis)
Margins for upper and lower zones
Uniform margins around center mask
(0.1 = 10 %)
Mask name
(displayed in Acquisition Settings)
Intensity Mask (NRZ 40G ITU)
Mask type tag
Custom margins around center mask (use
a <Polygon> block as for the mask itself)