Ivoclar Vivadent IPS e.max Press Abutment Solutions v.2 - Manual (Page 9)

9
Layer­thicknesses­of­the­ceramic­components
Observing the geometry requirements of the pressed objects made of IPS e.max Press material is the key to success for a
durable restoration. The more attention given to the design, the better the final results and the clinical success will turn out
to be. The following basic guidelines have to be observed:
Marginal
shoulder width S
A
Height
H AK
Height
Ti base
Wall thickness W
AK
Width abutment crown B
AK
Width abutment crown B
AK
Hybrid­abutment­crown
Hybrid­abutment
– The marginal shoulder width S
A
must be at least
0.6 mm.
– The wall thickness W
AK
must be larger than 1.5 mm
for the entire circumference.
– The opening of the screw channel must not be
located in the contact point areas or areas with a
masticatory function. If this is not possible, a hybrid
abutment with a separate crown should be
preferred.
– The width of the hybrid abutment crown B
AK
is
limited to 6.0 mm from the axial height of contour
to the screw channel.
– The height H
AK
must not exceed twice the height of
the Ti base by more than 2 mm.
– The marginal shoulder width S
A
must be at least
0.6 mm.
– Create an emergence profile with a right angle at
the transition to the crown (see picture).
– The wall thickness W
A
must be at least 0.5 mm.
– The height H
A
must not exceed twice the height of
the Ti base H
Ti
.
– The hybrid abutment should be designed in a simi-
lar way as a prepared natural tooth:
– Circular epi-/supragingival shoulder with rounded
inner edges or a chamfer.
– In order for the crown to be cemented to the
hybrid abutment using a conventional/self-
adhesive cementation protocol, retentive surfaces
and a sufficient "preparation height" must be
observed.
– The width B
AK
of the crown is limited to 6.0 mm
from the axial height of contour to the screw
channel of the hybrid abutment.
Marginal
shoulder width S
A
Height
H A
Wall thickness W
A
Application
procedure
­–
­Fabrication
­Hybrid
­Abutment
­and
­Hybrid
­Abutment
­Cr
own