Brooks Instrument GF81 - Manual (Page 10)

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Brooks ® GF40/GF80/GF81 Devices
Installation and Operation Manual
X-TMF-GF40-GF80-Series-MFC-eng
Part Number: 541B161AAG
June, 2013
Section 1 Introduction
Term or Acronym Definition
CSR Customer Special Requirement.
CVD Chemical Vapor Deposition.
DSP Digital Signal Processor.
EPI Epitaxy (EPI). A process technology where a pure silicon
crystalline structure is deposited or “grown” on a
bare wafer, enabling a high-purity starting point
for building the semiconductor device.
HBD Horizontal Base Down.
HLD Horizontal Label Down.
HLU Horizontal Label Up.
HUD Horizontal Upside Down.
GF40/GF80 Series MultiFlo capable digital device.
GF81 Series High Flow Digital Device.
F.S. Full Scale.
LED Light Emitting Diode.
MFC Mass Flow Controller.
MultiFlo Configurator I/O communication software package that
configures gas and flow ranges.
MultiFlo Technology A physics-based calibration methodology that
enables gas and flow range configuration within
a defined standard configuration.
PID Proportional Integral Derivative Controller.
PSIA Pounds per Square Inch Absolute.
PSID Pounds per Square Inch Differential.
PSIG Pounds per Square Inch Gauge.
ROR As pressure increases, flow increases at a
pressure rate of rise, or ROR.
HC Standard Configuration w/ Hastelloy ® sensors
(to reduce reaction to corrosive gases).
S.P. Setpoint.
Step Technology Enables fast set point control through a high
speed DSP.
VID Vertical mounting attitude with inlet side facing
down.
VIU Vertical mounting attitude with inlet side facing up.
Table 1-2 Terms and Acronyms