Metrohm 774 Oven Sample Processor - Manual (Page 83)

5.4 Command reference
774 Oven Sample Processor, Instructions for use 77
settings” the turning direction and speed can be defined specifically for
each method. These can also be modified in a sequence with the corre-
sponding ‘DEF’ command.
If there is no vial in the rack position chosen, this is recognized by the
beaker sensor.
The changer reaction to a missing vial can be predefined in the Parameter
Menu under ">changer settings". The alternatives available are halting
the processing and issuing an error message or selecting the next rack po-
sition. For more information about this see page 70. If a special beaker is
missing, processing is always halted.
LIFT
9
LIFT >sample sequence
02 LIFT: 1 : rest mm
1 work,
rinse, shift,
special, rest,
0…100 mm
Positioning the lift
The first parameter of this command defines the lift
on which the command is to be executed. Since
the 774 Oven Sample Processor is equipped only
with Lift 1, it is not practical to enter any other
value at this point.
Raising or lowering of the lift to a defined position. Work and shift position
are rack-specifically defined in the Configuration Menu under “>rack defi-
nitions”. See also page 64. These parameters can also be changed in a
sequence using the corresponding ‘DEF’ command.
The rest position is the zero position (0 mm) of the lift i.e. the upper stop.
The lift can also be precisely positioned to the millimeter. The LEARN func-
tion is also available for this purpose. See also page 34.