INFICON IQM-233 Thin Film Deposition Controller PCI-Express Card Operating Manual - Manual (Page 106)

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IQM-233 Operating Manual
Ba 3.500 2.100 barium
BaF
2
4.886 0.793 barium fluoride
BaN
2
O
6
3.244 1.261 barium nitrate
BaO 5.720 *1.000 barium oxide
BaTiO
3
5.999 0.464 barium titanate (tetr)
BaTiO
3
6.035 0.412 barium titanate (cubic)
Be 1.850 0.543 beryllium
BeF
2
1.990 *1.000 beryllium fluoride
BeO 3.010 *1.000 beryllium oxide
Bi 9.800 0.790 bismuth
Bi
2
O
3
8.900 *1.000 bismuth oxide
Bi
2
S
3
7.390 *1.000 bismuth trisulphide
Bi
2
Se
3
6.820 *1.000 bismuth selenide
Bi
2
Te
3
7.700 *1.000 bismuth telluride
BiF
3
5.320 *1.000 bismuth fluoride
C 2.250 3.260 carbon (graphite)
C 3.520 0.220 carbon (diamond)
C
8
H
8
1.100 *1.000 parlyene (union carbide)
Ca 1.550 2.620 calcium
CaF
2
3.180 0.775 calcium fluoride
CaO 3.350 *1.000 calcium oxide
CaO-SiO
2
2.900 *1.000 calcium silicate (3)
CaSO
4
2.962 0.955 calcium sulfate
CaTiO
3
4.100 *1.000 calcium titanate
CaWO
4
6.060 *1.000 calcium tungstate
Cd 8.640 0.682 cadmium
CdF
2
6.640 *1.000 cadmium fluoride
CdO 8.150 *1.000 cadmium oxide
CdS 4.830 1.020 cadmium sulfide
CdSe 5.810 *1.000 cadmium selenide
CdTe 6.200 0.980 cadmium telluride
Ce 6.780 *1.000 cerium
CeF
3
6.160 *1.000 cerium (iii) fluoride
Table A-1 Material table (continued)
Formula Density Z-Ratio Material Name