Appendix – INFICON SQC-310 Thin Film Deposition Controller User Manual
Page 84
Appendix
Formula
Density
Z-Ratio
Material Name
Fe
7.860
0.349
Iron
Fe
2
O
3
5.240
*1.000
Iron Oxide
FeO
5.700
*1.000
Iron Oxide
FeS
4.840
*1.000
Iron Sulphide
Ga
5.930
0.593
Gallium
Ga
2
O
3
5.880
*1.000
Gallium Oxide (B)
GaAs
5.310
1.590
Gallium Arsenide
GaN
6.100
*1.000
Gallium Nitride
GaP
4.100
*1.000
Gallium Phosphide
GaSb
5.600
*1.000
Gallium Antimonide
Gd
7.890
0.670
Gadolinium
Gd
2
O
3
7.410
*1.000
Gadolinium Oxide
Ge
5.350
0.516
Germanium
Ge
3
N
2
5.200
*1.000
Germanium Nitride
GeO
2
6.240
*1.000
Germanium Oxide
GeTe
6.200
*1.000
Germanium Telluride
Hf
13.090
0.360
Hafnium
HfB
2
10.500
*1.000
Hafnium Boride,
HfC
12.200
*1.000
Hafnium Carbide
HfN
13.800
*1.000
Hafnium Nitride
HfO
2
9.680
*1.000
Hafnium Oxide
HfSi
2
7.200
*1.000
Hafnium Silicide
Hg
13.460
0.740
Mercury
Ho
8.800
0.580
Holminum
Ho
2
O
3
8.410
*1.000
Holminum Oxide
In
7.300
0.841
Indium
In
2
O
3
7.180
*1.000
Indium Sesquioxide
In
2
Se
3
5.700
*1.000
Indium Selenide
In
2
Te
3
5.800
*1.000
Indium Telluride
InAs
5.700
*1.000
Indium Arsenide
InP
4.800
*1.000
Indium Phosphide
InSb
5.760
0.769
Indium Antimonide
Ir
22.400
0.129
Iridium
K
0.860
10.189
Potassium
KBr
2.750
1.893
Potassium Bromide
KCl
1.980
2.050
Potassium Chloride
KF
2.480
*1.000
Potassium Fluoride
KI
3.128
2.077
Potassium Iodide