INFICON XTC/3 Thin Film Deposition Controller Operating Manual - Manual (Page 214)

A - 6
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XTC/3 Operating Manual
Pr 6.780 *1.000 praseodymium
Pr
2
O
3
6.880 *1.000 praseodymium oxide
Pt 21.400 0.245 platinum
PtO
2
10.200 *1.000 platinum oxide
Ra 5.000 *1.000 radium
Rb 1.530 2.540 rubidium
RbI 3.550 *1.000 rubidium iodide
Re 21.040 0.150 rhenium
Rh 12.410 0.210 rhodium
Ru 12.362 0.182 ruthenium
S
8
2.070 2.290 sulfur
Sb 6.620 0.768 antimony
Sb
2
O
3
5.200 *1.000 antimony trioxide
Sb
2
S
3
4.640 *1.000 antimony trisulfide
Sc 3.000 0.910 scandium
Sc
2
O
3
3.860 *1.000 scandium oxide
Se 4.810 0.864 selenium
Si 2.320 0.712 silicon
Si
3
N
4
3.440 *1.000 silicon nitride
SiC 3.220 *1.000 silicon carbide
SiO 2.130 0.870 silicon (II) oxide
SiO
2
2.648 1.000 silicon dioxide
Sm 7.540 0.890 samarium
Sm
2
O
3
7.430 *1.000 samarium oxide
Sn 7.300 0.724 tin
SnO
2
6.950 *1.000 tin oxide
SnS 5.080 *1.000 tin sulfide
SnSe 6.180 *1.000 tin selenide
SnTe 6.440 *1.000 tin telluride
Sr 2.600 *1.000 strontium
SrF
2
4.277 0.727 strontium fluoride
SrO 4.990 0.517 strontium oxide
Ta 16.600 0.262 tantalum
Ta
2
O
5
8.200 0.300 tantalum (V) oxide
TaB
2
11.150 *1.000 tantalum boride
TaC 13.900 *1.000 tantalum carbide
Table A-1 Material table (continued)
Formula Density Z-Ratio Material Name