Metrohm viva 1.0 (process analysis) - Manual (Page 976)

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964 ￭￭￭￭￭￭￭￭
viva 1.0 (for Process analysis)
No sample amount has to be entered for the suppressor determina-
tion. The sample is added with the ADD SAMPLE DT command, in
which the addition volume is defined.
Standard solution
Designation for all calibration and spiking solutions used for calibration
methods with and without solution exchange.
Substance
Chemical substance (element or compound), the concentration of which is
to be determined by means of a measurement procedure.
Suppressor
In electroplating bath analysis, "suppressor" refers to an organic additive
that reduces the deposition rate of copper. As even small amounts of sup-
pressor can significantly reduce metal deposition, this characteristic effect
can be used to determine the suppressor concentration in an electroplat-
ing bath.
Sweep
In voltammetry, "sweep" refers to a single current/potential measurement.
In the case of the CVS measuring mode, the potential is changed at a con-
stant potential sweep rate from the start potential to vertex potential 1,
from there to vertex potential 2 and then back again to the start potential.
The current i is measured as a function of the potential U in this process.
Track
Partial run of a method consisting of commands. The following types
exist: main track, VA track, normal track and special tracks (see Chapter
5.5.1.2, page 372).
VMS (Virgin Make-up Solution)
Basic solution with a composition that should be as identical as possible to
that of the electroplating bath solution to be analyzed, except that it con-
tains no organic additives. When analyzing electroplating baths, it is used
to determine the start value with the calibration method DT (see Glossary,
page 958) and as the initial solution for preparing the intercept solution
with the calibration method MLAT (see Glossary, page 961).
Variation
In voltammetric measurements, all data recorded is stored in a data set.
The result variables belonging to a single voltammogram are unambigu-
ously distinguished by an index X for the variations and another index Y
for the replications (see Glossary, page 962). Variation refers to a mea-