INFICON IC/5 Thin Film Deposition Controller - Manual (Page 305)

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IC/5 Operating Manual
182 Sc
2
O
3
3.860 *1.000 Scandium Oxide
183 Se 4.810 0.864 Selenium
184 Si 2.320 0.712 Silicon
185 Si
3
N
4
3.440 *1.000 Silicon Nitride
186 SiC 3.220 *1.000 Silicon Carbide
187 SiO 2.130 0.870 Silicon (II) Oxide
188 SiO
2
2.648 1.000 Silicon Dioxide
189 Sm 7.540 0.890 Samarium
190 Sm
2
O
3
7.430 *1.000 Samarium Oxide
191 Sn 7.300 0.724 Tin
192 SnO
2
6.950 *1.000 Tin Oxide
193 SnS 5.080 *1.000 Tin Sulfide
194 SnSe 6.180 *1.000 Tin Selenide
195 SnTe 6.440 *1.000 Tin Telluride
196 Sr 2.600 *1.000 Strontium
197 SrF
2
4.277 0.727 Strontium Fluroide
198 SrO 4.990 0.517 Strontium Oxide
199 Ta 16.600 0.262 Tantalum
200 Ta
2
O
5
8.200 0.300 Tantalum (V) Oxide
201 TaB
2
11.150 *1.000 Tantalum Boride
202 TaC 13.900 *1.000 Tantalum Carbide
203 TaN 16.300 *1.000 Tantalum Nitride
204 Tb 8.270 0.660 Terbium
205 Tc 11.500 *1.000 Technetium
206 Te 6.250 0.900 Tellurium
207 TeO
2
5.990 0.862 Tellurium Oxide
208 Th 11.694 0.484 Thorium
209 ThF
4
6.320 *1.000 Thorium.(IV) Fluoride
210 ThO
2
9.860 0.284 Thorium Dioxide
211 ThOF
2
9.100 *1.000 Thorium Oxyfluoride
212 Ti 4.500 0.628 Titanium
213 Ti
2
0
3
4.600 *1.000 Titanium Sesquioxide
214 TiB
2
4.500 *1.000 Titanium Boride
Table A-1 Material Table (continued)
Code Formula Density Z-Ratio Material Name