INFICON IC/5 Thin Film Deposition Controller - Manual (Page 306)

A - 8
IP
N 07
4-
23
7A
E
IC/5 Operating Manual
215 TiC 4.930 *1.000 Titanium Carbide
216 TiN 5.430 *1.000 Titanium Nitride
217 TiO 4.900 *1.000 Titanium Oxide
218 TiO
2
4.260 0.400 Titanium (IV) Oxide
219 TI 11.850 1.550 Thallium
220 TIBr 7.560 *1.000 Thallium Bromide
221 TICI 7.000 *1.000 Thallium Chloride
222 TII 7.090 *1.000 Thalliurn Iodide (B)
223 U 19.050 0.238 Uranium
224 U
3
O
8
8.300 *1.000 Tri Uranium Octoxide
225 U
4
O
9
10.969 0.348 Uranium Oxide
226 UO
2
10.970 0.286 Uranium Dioxide
227 V 5.960 0.530 Vanadium
228 V
2
O
5
3.360 *1.000 Vanadium Pentoxide
229 VB
2
5.100 *1.000 Vanadium Boride
230 VC 5.770 *1.000 Vanadium Carbide
231 VN 6.130 *1.000 Vanadium Nitride
232 VO
2
4.340 *1.000 Vanadium Dioxide
233 W 19.300 0.163 Tungsten
234 WB
2
10.770 *1.000 Tungsten Boride
235 WC 15.600 0.151 Tungsten Carbide
236 WO
3
7.160 *1.000 Tungsten Trioxide
237 WS
2
7.500 *1.000 Tungsten Disulphide
238 WSi
2
9.400 *1.000 Tungsten Silicide
239 Y 4.340 0.835 Yttrium
240 Y
2
0
3
5.010 *1.000 Yttrium Oxide
241 Yb 6.980 1.130 Ytterbium
242 Yb
2
O
3
9.170 *1.000 Ytterbium Oxide
243 Zn 7.040 0.514 Zinc
244 Zn
3
Sb
2
6.300 *1.000 Zinc Antimonide
245 ZnF
2
4.950 *1.000 Zinc Fluoride
246 ZnO 5.610 0.556 Zinc Oxide
247 ZnS 4.090 0.775 Zinc Sulfide
Table A-1 Material Table (continued)
Code Formula Density Z-Ratio Material Name