INFICON IC/5 Thin Film Deposition Controller - Manual (Page 99)

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IC/5 Operating Manual
4.3 Material Definition Parameters
Rate Avg. and Thickness values are shown on Material definition page 3, for each
sensor in use. The Rate Avg. shown is the rate averaged over the last 2.5 seconds
minus the most recent 0.5 seconds. This is the same average as shown in the
SENSORS display. Thickness is the value at each sensor. The thickness values
are zeroed when the zero thickness function key is pressed when in the OPERATE
display. N/A is shown for sensors which are not in use.
DENSITY . . . . . . . . . . . . . . . . . . . . . 0.100 to 99.999 gm/cc
This parameter is specific to the material being deposited onto the Crystal. It is
one of two parameters that relate the mass loading on the crystal to a thickness.
Values range from 0.100 to 99.999. If a material is chosen from the Material
Library the density is automatically entered. The default value is 10.00.
Z-RATIO . . . . . . . . . . . . . . . . . . . . . . 0.100 to 15.000
This parameter is specific to the material being deposited. It is one of two
parameters that relate the mass loading on the crystal to a thickness. Values
range from 0.100 to 15.000. If a material is chosen from the Material Library the
Z-ratio is automatically entered. The default value is 1.00. This parameter is
superseded if Auto Z-ratio is selected in Source/Sensor Set-Up.
SOURCE . . . . . . . . . . . . . . . . . . . . . 1,2,3,4,5,6
This parameter determines which source, defined in the Source Set Up display,
is to be used for source control voltage for the material being defined. Values
can range from 1 to 6. The default is 1. This parameter cannot be changed
while a process is running.
CONTROL LOOP . . . . . . . . . . . . . . 0,1,2
This parameter establishes the control loop algorithms pertaining to either a
slow responding source or a fast responding source. Permissible values are 0,
1, or 2. Select a 0 to choose the non-PID control loop, good for fast- and
medium-speed responding systems with high noise levels (e.g., an electron
beam gun with or without a liner, having a large sweep amplitude of low
frequency, 10 Hz or less). Select a 1 for the PI control loop, good for fast,
medium, or slow systems with medium noise levels (e.g., an electron beam
gun with medium sweep amplitude frequency, 20 to 100 Hz; also, sputtering
and resistive sources). Select a 2 for the PID Control Loop, good for fast,
medium or slow systems with low noise levels (e.g., an electron beam gun with
sweep off or at a high frequency, 100+ Hz; also, sputtering and resistive
sources).