Metrohm viva 1.1 (ProLab) - Manual (Page 1060)

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1048 ￭￭￭￭￭￭￭￭
viva 1.1 (for process analysis)
U
eq
i
an
i
cath
U
t
t
U
cl
U
pl
U
st U
eq
t
eq
t
cl
t
st
t
pl
U
eq
Equilibration potential
(see Chapter 5.5.2.11.3.4,
page 636)
t
eq
Equilibration time (see
Chapter 5.5.2.11.3.4,
page 636)
U
pl
Plating potential (see
Chapter 5.5.2.11.3.4,
page 636)
t
pl
Plating time (see Chapter
5.5.2.11.3.4, page 636)
U
st
Stripping potential (see
Chapter 5.5.2.11.3.4,
page 636)
t
st
Stripping time (see
Chapter 5.5.2.11.3.4,
page 636)
U
cl
Cleaning potential (see
Chapter 5.5.2.11.3.4,
page 636)
t
cl
Cleaning time (see Chap-
ter 5.5.2.11.3.4, page
636)
CPVS is used in the electroplating industry as a method for determining
organic additives in electroplating baths. This method is an indispensable
part of production control for many types of technical coatings and partic-
ularly in the manufacturing of printed circuit boards for electronic equip-
ment. The main area of application is the determination of brightener in
acidic copper baths. Quantitative determination of the additives takes
place via their influence on the deposition of the main component of the
electroplating bath. As the measurement utilizes a procedure that corre-
sponds to the production process, the activity of the additives and thus
their effectiveness in the electroplating process is measured directly.
CVS (Cyclic Voltammetric Stripping)
In the CVS (Cyclic Voltammetric Stripping) measuring mode, the potential
of a rotating disk electrode (RDE, e.g. Pt) is changed once or several times
at a constant potential sweep rate from the start potential to vertex
potential 1, from there to vertex potential 2 and then back again to the
start potential. The current I is measured as a function of the potential U